发明名称 SPUTTERING DEVICE
摘要 PURPOSE:To form a uniform film on a substrate by disposing magnet groups for controlling the erosion regions of a target in such a way that the erosion groups form >=2 closed loops. CONSTITUTION:A cylindrical core 4a is projected in the central position of a packing plate surface of a target 1 on the side opposite to a substrate and the 1st and 2nd annular yokes 4c, 4d consisting of magnetically permeable materials are successively projected to enclose said core. A magnet group 5a for controlling the 1st erosion region is disposed so as to cross radially the core 4a and the yoke 4c and a magnet group 5b for controlling the 2nd erosion region is disposed so as to cross the yokes 4c, 4d. Both magnet groups 5a, 5b are held in such an attitude that the polarities of the respective magnets in the groups 5a, 5b are made symmetrical with the yoke 4c. Then the erosion regions formed on the surface of the target 1 facing the substrate form two closed loops 6'a, 6'b and the atom component shift of the film to be deposited on the substrate is effectively offset and compensated.
申请公布号 JPS60116774(A) 申请公布日期 1985.06.24
申请号 JP19830226255 申请日期 1983.11.30
申请人 NIHON TEKISASU INSUTSURUMENTSU KK 发明人 KAERIYAMA TOSHIYUKI
分类号 C23C14/36;C23C14/35;H01J37/34;H01L21/203;H01L21/285 主分类号 C23C14/36
代理机构 代理人
主权项
地址