| 摘要 |
PURPOSE:To provide a thin film thermal head for thermal printing made of a high specific resistance film excellent in the stability with limited variation rate in the resistance value of the resistance film by employing a Ta-Ni-SiO2 based mixed thin film as heat generating body. CONSTITUTION:For example, a product obtained by mixing and sintering metals of Ta, Ni and SiO2 and an insulating material is made a target and formed as film on an alumina or glass substrate by sputtering. Then, the film thus obtained is subjected to a patterning by a photolithography and the resulting Ta-Ni-SiO2 based mixed thin film is used as heat generating resistor to obtain the desired thermal head. |
