发明名称 |
METHOD OF MANUFACTURING A PATTERN OF CONDUCTIVE MATERIAL |
摘要 |
A method of providing narrow conductor tracks of metal silicide is provided. According to this technique, a pattern of polycrystalline silicon covered by a protective layer is converted along the edges into the silicide by covering the device with a metal. The edges are then silicidized laterally over a distance of 20 to 500 nm. The remaining silicon is selectively removed, and the tracks obtained can serve as conductor masks, such as, for example, a plate of a capacitor. |
申请公布号 |
EP0142186(A3) |
申请公布日期 |
1985.06.19 |
申请号 |
EP19840201431 |
申请日期 |
1984.10.05 |
申请人 |
N.V. PHILIPS' GLOEILAMPENFABRIEKEN |
发明人 |
WOERLEE, PIERRE HERMANUS;VERHOEVEN, JOHANNES F. C. M. |
分类号 |
H01L21/3205;H01L21/02;H01L21/033;H01L21/266;H01L21/28;H01L21/3213;H01L21/336;H01L21/339;H01L23/52;(IPC1-7):H01L21/28;H01L21/31 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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