发明名称 PHOTO SEMICONDUCTOR DEVICE
摘要 PURPOSE:To attain the positional adjustment of a luminous source of photo semiconductor to a lens with high accuracy by a method wherein the inner wall of a tapered through hole is coated with a material capable of realizing the state of high viscosity, and varying in viscosity with temperature and time. CONSTITUTION:The inner wall of the tapered through hole 5 is coated with a metal of low melting point and high viscosity into a film 8. On condition that the minimum thickness of the film whereby a spherical lens 4 can be held at the optimum position to a laser chip 2 is (t), when the inner wall of the through hole is coated in ring form at its region of the positional adjustment width for the lens with the metal having a low melting point and a high viscosity in such a manner that the film thickness becomes above (t), and the lens is pushed-in with an exclusive jig during the heating of this coat, the lens 4 can be placed at the optimum position.
申请公布号 JPS60113487(A) 申请公布日期 1985.06.19
申请号 JP19830219500 申请日期 1983.11.24
申请人 TOSHIBA KK 发明人 CHINEN YUKIO;KOBAYASHI KENJI
分类号 G02B7/02;G02B6/42;H01S5/00;H01S5/022 主分类号 G02B7/02
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