| 摘要 |
An electron source or ion source of a charged particle beam exposure device comprises a matrix of elements, each of which forms an elementary beam. The matrix is arranged in a field space such that the elementary beams emerge from the matrix in a mutually diverging manner. At the area where the distance between the elementary beams is sufficiently large, there is arranged an electrode system with a matrix of beam deflectors in which each of the elementary beams can be independently manipulated. Near a target to be exposed, there is arranged an aperture plate which completely or partly transmits each of the modulated elementary beams so that spot-shaping can be performed. Using the device in accordance with the invention, some one hundred possible different patterns can be written simultaneously.
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