| 摘要 |
PURPOSE:To use either of a photo-mask with a coating plate for a dust-proof countermeasure or a conventional photo-mask by one exposure device by previously fitting a transparent parallel plate having an optical path optically equal to that of a coating material for a photo-mask with a coating in an exposure optical path between the position of a photo-mask pattern as an original picture are a projection lens and disposing a transparent plate in the optical path when using a photo-mask with no coating. CONSTITUTION:Beams from an illumination system 3 are transmitted through a photo-mask 2, which is placed on a device reference surface 8 and the back thereof has a pattern 7, and projected to a projection lens 1, and beams focussed by the lens 1 are projected to the surface of a sample 4 placed on a sample base 5. In the constitution, a detachably inserted transparent plate 6 for correcting an optical path is fitted previously under the photo-mask 2. Accordingly the transparent plate 6 is retreated to the outside of the optical path and the sample is exposed when using the mask 2 to which a coating for a dust-proof countermeasure is mounted, and the transparent plate 6 is inserted into the optical path when the mask 2 is not used. |
