| 摘要 |
<p>PURPOSE:To enhance heat resistance, to enable formation of a multicolor optical filter element through vacuum vapor deposition, and to enhance resolution by using an inorg. material together with a heat resistant coloring material for a multilayer interference film pattern to form a colored thin film pattern, and forming an intermediate protective film. CONSTITUTION:A multilayer interference film pattern, and a thin film layer colored with a heat resistant coloring agent are formed on a transparent base 21, and a resist pattern is formed on this film by the photomechanical process, and then, the colored thin film layer and the resist pattern are simultaneously removed to form a multicolor optical filter element composed of the multilayer interference film stripes and the colored thin film stripes. The element 22 face is coated with a 500-2,000nm thick resin resistant to heat and chemicals, and hardened tor form an intermediate protective film 23, and on this film 23, a transparent conductive film 24 is formed by vacuum vapor deposition. Since such a multilayer interference film pattern is made of an inorg. material, it is high in heat resistance, and it can be subjected to dry etching, and the transparent conductive film 24 can be formed on the element 22 by using the heat resistant coloring agent and the vacuum vapor deposition method, and heat resistance is enhanced by forming the intermediate protective film 23. As a result, operation efficiency can be improved and resolution can be enhanced.</p> |
