发明名称 ION BEAM DEVICE
摘要 PURPOSE:To obtain the captioned device which can keep the sample chamber in high vacuum and analyze the sample, even if an electron bombardment-type ion source is used, by providing a means which injects oxygen or cesium in order to ionize gas in a path leading from the ion source to the sample. CONSTITUTION:Argon gas introduced into an ionizing chamber 1 is ionized with therminal coming from a filament 4, and the generated argon ions AI pass through an ion bombardment chamber 7 and are radiated on sample 22. When a valve 15 is opened and oxygen gas is introduced from a bomb 14 into the hollow part of an electrostatic lens 10, the oxygen gas is injected from an injection nozzle 12 toward an ion beam path, the oxygen gas collides with argon ions and then is ionized. Oxygen ions generated by this ionization are converged by an object lens OL and radiated together with argon ions on the analysis spot of sample 22. By the irradiation of the oxygen ions and argon ions, secondary ions generated from the sample 22 are separated in proportion to their mass by means of a mass spectrometer and detected by a detector 24.
申请公布号 JPS60101850(A) 申请公布日期 1985.06.05
申请号 JP19830209677 申请日期 1983.11.08
申请人 NIPPON DENSHI KK 发明人 SAKAI YUUJI
分类号 G01N23/225;G21K1/00;G21K5/04;H01J37/252;H05H7/00 主分类号 G01N23/225
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