| 摘要 |
A heat reflecting pane comprises a substantially transparent glass substrate which has a layer of silicon oxide thereon and a layer of titanium dioxide in the rutile form on the side of the silicon oxide layer remote from the glass pane, the glass substrate having been toughened by heat treatment. The pane is formed by coating the glass substrate with a thin layer of silicon oxide, then applying a layer of titanium to the silicon oxide layer by vacuum deposition, the oxidizing the titanium at over 550 DEG C. to form titanium oxide in the rutile form. The silicon oxide layer prevents the rutile layer from becoming opaque when the pane is heated to the temperature necessary for heat treatment of the glass substrate, which may be during the heating step in which the titanium is oxidized or may be subsequently. |
