发明名称 Vorrichtung zum Herstellen einer Photolackmaske
摘要 1,250,464. Supporting photo-sensitive materials. SIEMENS A.G. Oct.28, 1968 [Oct.27, 1967], No.51008/68. Heading G2A. Apparatus used in the manufacture of a photosensitive varnish mask carrying a plurality of spaced images by successively locally exposing a varnish layer 8 at spaced locations comprises a first table A for holding the layer and its carrier 7, a second table B to which the first is mechanically coupled and upon which the first table is horizontally adjustable in two directions at right angles, a mechanical transmission system 5 for effecting coarse adjustment of slide 3 of the table B relative to a fixed reference plane 1, and a continuously operable adjustment means 10 for moving slide 4 of the table A relative to the table B. In use, the slide 3 is adjusted by the system 5, provided at least in pairs for adjustment in mutually perpendicular horizontal directions; the position of the slide4 relative to the reference plane monitored optically by means of markers 6 and interference bands 6a; the position of the slide 4 adjusted by the means 10; and the exposure carried out. This sequence is repeated to obtain the next image. After all the required exposures have been made, the varnish layer is processed and used in the production of a plurality of semiconductor components from a single plate. The fine adjustment means, provided in at least pairs for adjustment of the slide 4 in two directions at right angles, may be a rod (11), Fig. 2 (not shown) the dimensions of which are changed by application of a temperature change, or of an electric, electromagnetic, or magnetic field. Alternatively Figs.3 and 5 (not shown) the slide (4) may be held in equilibrium by pairs of springs (C, D, E, F), the springs (C, D) being heated to change the positions of the slide (4). In another embodiment, Fig.4 (not shown), the slide (4) may be positioned by springs and variable magnetic fields. If desired, the slide (4) can be continuously moved in one horizontal direction and as this happens the number of interference bands passed counted so as to trigger a flash device or a high speed shutter on specific counts. There may be a fluid bearing between the tables A, B.
申请公布号 DE1614644(A1) 申请公布日期 1970.02.26
申请号 DE19671614644 申请日期 1967.10.27
申请人 SIEMENS AG 发明人 HENKER,DR.HEINZ
分类号 B23Q1/34;G03F7/20 主分类号 B23Q1/34
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