MANUFACTURE OF NIOBIUM NITRIDE FILM

摘要

PURPOSE:To obtain simply a stable niobium nitride film with high crystallizability by vapor-depositing niobium nitride on a substrate by ion beam sputtering in a nitrogen atmosphere using niobium or niobium nitride as a target. CONSTITUTION:A chamber 1 is evacuated to 10<-5>-10<-4>Torr, and gaseous Ar is introduced into an ion gun 2. Ar ion beams from the gun 2 are converted into neutral beams with a neutralizer 4, and the neutral beams hit a round target 5 of niobium or niobium nitride. Gas contg. >=25% nitrogen is introduced into the chamber 1 to vapor-deposit niobium nitride on a substrate 6.