发明名称 |
PROCESS FOR FORMING METALLIC IMAGES |
摘要 |
Metallic images of uniform quality can be formed on substrates having through-holes by a process using a positive type resist characterized by using as a coating solution for the substrate a solution of a photosensitive material of (a) at least one organic compound having at least one linkage of -M-M-M )n (M=Si, Ge or Sn; n=0, 1 or more) in the molecule or (b) a mixture of at least one organic compound (a) mentioned above and at least one photosensitizer, dissolved in a solvent such as a halogenated hydrocarbon, an aromatic hydrocarbon, a heterocyclic compound, or a mixture thereof, followed by irradiation with an actinic light through a photomask and electroless plating. |
申请公布号 |
DE3169660(D1) |
申请公布日期 |
1985.05.09 |
申请号 |
DE19813169660 |
申请日期 |
1981.06.22 |
申请人 |
HITACHI, LTD. |
发明人 |
SAKURAI, HIDEKI;NAKATANI, MITSUO;OKA, HITOSHI;YOKONO, HITOSHI;ISOGAI, TOKIO |
分类号 |
G03C5/58;G03F7/004;H05K3/18;(IPC1-7):G03C1/72;G03F7/10;G03C5/00 |
主分类号 |
G03C5/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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