| 摘要 |
<p>PURPOSE:To enable to easily disriminate the presence or not of a defect on a pattern, the degree of the defect and the like in the contrast with a circuit pattern by a method wherein the pattern of a photomask, a wafer and the like are superposed on the same picture as the circuit pattern, and they are brought in the state wherein they are compared on the same visual field. CONSTITUTION:The defective coordinate of the photomask 1 recorded in a magnetic tape 5 is read by a microcomputer 6, and the positioning of the photomask 1 is performed based on the result of processing. The pattern of the photomask 1 is image-picked up 8, sent to a CRT9 and indicated on a picture 10 as the code P. On the other hand, the information of a circuit pattern is called out and indicated on the picture 10 of the CRT9 as shown by the code A. In that case, a starting position matching is performed, and they are adjusted and controlled in such a manner that they will be picture-compounded in the state wherein the two patterns are completely superposed each other without deviation. As a result, the superposed image of the two patterns can be observed on the same field of vision on the same picture, the presence or not of the defect of the photomask 1, the degree of its magnitude and the like can be compared with the circuit pattern directly, thereby enabling to easily give a discrimination.</p> |
