| 摘要 |
PURPOSE:To match exactly the surface of a sample with the predetermined position of an X-ray optical axis by detecting the deviation of the sample surface from the home position by microscopes placed in plural positions. CONSTITUTION:The substantially large plane standard sample is fixed by means of a spring 6 to a sample base 1 and the focal positions of the microscopes 7-10 are determined in such a manner that the sample coincides exactly with the home position from the angle and intensity of the scattered X-rays. For example, a silicon wafer is used as the standard sample and small marks for determining the position are preliminarily put to the points corresponding to the four corners in the sample position of a powder sample holder 3. Such standard sample is then removed and the powder sample 5 is mounted on the sample base. The out-of-focus images are obtd. from any or all of the microscopes 7-10 if the sample is deviated from the home position and therefore the deviation of the sample from the home position is detected. |
