| 摘要 |
PURPOSE:To generate general purpose alignment pattern and transfer it with high accuracy by providing, in the side of mask, the contour figure wherein the L-shaped patterns in different sizes are arranged proportionally and symmetrically. CONSTITUTION:A plurality of contour figures 12 are sequentially formed proportionally and symmetrically to the internal circumference from the external circumference with the scaling and then apertures are formed. Thereby, a pattern image 11 for alignment of masks 1 formed like a letter L. This shape corresponds to the pattern image for alignment of substrate 2 formed in different size indicated by the dotted line and alignment can be realized easily at a high speed. When the pattern image 14 where apertures 15 are radially formed is used, the overlapped pattern portions are reduced, making easier the alignment. |
