发明名称 |
Apparatus for physical vapor deposition |
摘要 |
An apparatus for physical vapor deposition comprising a vacuum casing one end of which is open; a sealing member provided at the opening of the casing; an electrode for physical vapor deposition, such as a target electrode or an electrode for heating evaporation, which is provided in the casing; and an exhaust hole for exhausting gases in the casing, which is provided at a predetermined wall portion of the casing. The apparatus may also be provided with a gas introducing hole and a bias electrode. The casing is integrally fitted to a body to be treated at the opening end portion thereof by means of the sealing member to form a vacuum chamber therein. This apparatus is compact and enables the surface treatment of a large or immovable body without moving the body.
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申请公布号 |
US4514275(A) |
申请公布日期 |
1985.04.30 |
申请号 |
US19840594444 |
申请日期 |
1984.03.30 |
申请人 |
KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO |
发明人 |
SHIMADA, HISASHI;ARAI, TOHRU;ENDO, JUNJI |
分类号 |
C23C14/38;C23C14/00;C23C14/04;C23C14/24;C23C14/30;C23C14/32;C23C14/34;C23C14/56;C23F4/02;(IPC1-7):C23C15/00 |
主分类号 |
C23C14/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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