| 摘要 |
<p>Appts. for mfre. of compound material as in NL 7005914 comprises a vacuum space, with a vacuum of at least 10-4 Torr, containing a vapour concentrate chamber whose walls are electrically connected to the mass and heated to the rebound temp. The chamber surrounds a vapour source for one of the components of the required alloy, and a substrate, which consists of the other component and under which a chill mould is situated. The substrate has devices for bringing it to an electrical attractive potential for the ionised vapour and to the melting temp. of the required alloy. The chamber has one or more openings for the passage of electron beams coming from one or more guns mounted in the space, but outside of the chamber.</p> |
