| 摘要 |
PURPOSE:To obtain a sample suitable for a transmission type electron microscope having a large area, by synchronizing the light emitting distribution from a sample crystal by ion beam excitation with the scanning period of the ion beam, forming an image, and preparing the thin film sample. CONSTITUTION:A crystal 1 with a finished mirror surface is mounted in a holder 2 and scanned and etched by ion beams from duo-plasmatrons 3 and 4. The light beams emitted from the crystal 1 are inputted to photomultipliers 10 and 11 through optical fibers 5 and 6. The light beams are inputted to CRTs 14 and 15 through amplifiers 12 and 13 in synchronization with a scanning period, and images are displayed. When a non-light emission area due to the intended lattice defect is observed on either surface, the etching of the surface is stopped and the opposite surface is etched. When the crystal 1 becomes thin, the resolution of the image is increased, and the approaching to the final stage can be detected. In this state, a tungsten lamp is turned ON. The etching is performed until the suitable thickness of the TEM sample is obtained, with the sample being observed through a window 17. |
