| 摘要 |
PURPOSE:To form a stable micropattern high in precision on the film to be formed on a substrate having different levels by forming an interlayer through a CVD method using light in a multiplayer resist process. CONSTITUTION:The three players of the first resist film 13, an interlayer 14, and the second resist film 15 are formed on the film 12 of a substrate 11 to be etched, and a pattern is successively transferred to the lower layers to selectively etch the film 12 to be etched. At that time, a CVD method using light is applied to formation of the interlayer 14 to enable its formation, for example, at a temp. lower than about 100 deg.C. As a result, trouble, such as striations due to uneven coating in formation the interlayer 14, and cracks during baking, poor adhesion between the layer 14 and the film 15, etc. can be prevented, and a micropattern of high precision can by stably formed even on the film 12 formed on the substrate 11 having different level. |
