| 摘要 |
PURPOSE:To lengthen the distance of movement of a carriage by making the height of a mask surface lower than that of a wafer surface. CONSTITUTION:A carriage 11 is moved in parallel on a stone surface plate 12. A mirror image formation optical system 15 and an alignment scope 13 are arranged on the stone surface plate 12. A wafer holder 10 holding a wafer 8, a mask holder holding a mask 1 and a mask-position holding member 14 are disposed to the carriage 11. A common shaft for a spherical mirror in the optical system 15 is arranged at an angle of 20 deg.-40 deg. to a wafer surface and a mask surface. The alignment scope 13 for observing the wafer 8 and the mask 1 is disposed between the wafer 8 and the optical system 15. The luminous flux 2 of illumination from the lower section of the mask 1 forms and bakes a pattern for the mask 1 on the wafer 8. In the constitution, the mask surface is made lower by 5-30mm. in a distance C in the vertical direction between the mask surface and the wafer surface. Accordingly, a collision with the scope 13 even on the scanning of the carriage 11 can be prevented. |
