发明名称 PROCESS FOR OBTAINING HIGH PURITY SILICA
摘要 <p>A method of producing high purity silica containing less than 2 ppm iron oxides and less than 50 ppm alumina from particulate silica or quartz concentrates containing both surface and occluded mineral impurities wherein the concentrate is agitated with an aqueous solution containing 3-20% by weight hydrofluoric acid at a temperature between 50.degree.C and the boiling point of the solution. The impurities dissolve at a greater rate than the silica and can be washed away or separated as a slime.</p>
申请公布号 CA1184740(A) 申请公布日期 1985.04.02
申请号 CA19820401560 申请日期 1982.04.23
申请人 INDUSMIN LIMITED 发明人 GERRITSE, MARTIN L.G.;PUETZ, GILBERT H.
分类号 C01B33/12;C01B33/18;C01B33/187;(IPC1-7):C01B33/187 主分类号 C01B33/12
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