发明名称 Device for cryogenically fabricating source material for plasma X-ray lasers
摘要 A device for fabricating a target of a lasing material and a pump material for lasing at X-ray wavelengths wherein one of the materials occurs naturally as a gas. A substrate of the other material is cooled below the freezing point of the one material occuring naturally as a gas. Then a gaseous atmosphere of the latter material is supplied to the cooled substrate so that a frozen layer of the latter material condenses onto the substrate to form the target.
申请公布号 US4508055(A) 申请公布日期 1985.04.02
申请号 US19830500725 申请日期 1983.06.03
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY 发明人 ELTON, RAYMOND C.;DIXON, ROBERT H.;FORD, JAMES L.
分类号 C23C14/54;H01S4/00;(IPC1-7):C23C13/08 主分类号 C23C14/54
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