发明名称 |
Device for cryogenically fabricating source material for plasma X-ray lasers |
摘要 |
A device for fabricating a target of a lasing material and a pump material for lasing at X-ray wavelengths wherein one of the materials occurs naturally as a gas. A substrate of the other material is cooled below the freezing point of the one material occuring naturally as a gas. Then a gaseous atmosphere of the latter material is supplied to the cooled substrate so that a frozen layer of the latter material condenses onto the substrate to form the target.
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申请公布号 |
US4508055(A) |
申请公布日期 |
1985.04.02 |
申请号 |
US19830500725 |
申请日期 |
1983.06.03 |
申请人 |
THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY |
发明人 |
ELTON, RAYMOND C.;DIXON, ROBERT H.;FORD, JAMES L. |
分类号 |
C23C14/54;H01S4/00;(IPC1-7):C23C13/08 |
主分类号 |
C23C14/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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