| 发明名称 |
CHEMICAL VAPOR DEPOSITION OF DIELECTRIC THIN FILMS OF RUTILE |
| 摘要 |
Thin films of titanium dioxide in the rutile form are deposited by chemical vapor deposition technique on a heated surface of a substrate by reacting titanium tetrachloride with oxygen, in the range of temperatures from 700 DEG to 900 DEG C.
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| 申请公布号 |
US3650815(A) |
申请公布日期 |
1972.03.21 |
| 申请号 |
USD3650815 |
申请日期 |
1969.10.06 |
| 申请人 |
WESTINGHOUSE ELECTRIC CORP. |
发明人 |
RATHINDRA N. GHOSHTAGORE;ROBERT F. YUT |
| 分类号 |
C23C16/40;(IPC1-7):C23C11/00;C23C13/00 |
主分类号 |
C23C16/40 |
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