发明名称 FORMING METHOD FOR CIRCUIT PATTERN
摘要 PURPOSE:To enable fine circuit patterns to be formed, by removing the corner sections from the patterns with electrolytic polishing, and by plating the patterns electrolytically, after the circuit patterns are formed by means of etching. CONSTITUTION:First, on the both surfaces of an insulating layer 1, flexible substrates with formed copper foil layers 2A, 2B are arranged. Second, after the layers are patterned with photoresists 3A, 3B, the layers are treated by means of etching to remove unnecessary sections and to form coil patterns 4A, 4B. Third, after the photoresists 3A, 3B are exfoliated, roundish patterns are obtained by removing the corner sections from the coil patterns 4A, 4B, namely, the shoulder sections of the pattern edges by means of electrolytic polishing. After that, a penetrating slot 5 for a through hole as part of the patterns is formed. Finally, the patterns are electrolytically plated, and coil patterns 6A, 6B are obtained by separating out copper on the surface of the coil patterns 4A, 4B.
申请公布号 JPS61254038(A) 申请公布日期 1986.11.11
申请号 JP19850094883 申请日期 1985.05.02
申请人 SONY CORP 发明人 OSAWA KENJI;WATANABE YOSHIO;MURAMOTO SHOICHI
分类号 H02K15/04;H01F5/00;H02K3/26 主分类号 H02K15/04
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