| 摘要 |
PURPOSE:To enable removal of sheet-shaped foreign matters adhering to a glass base plate by using a combination of washing with a rubbing member, such as a brush, and washing using an org. solvent for the washing step of the glass base plate. CONSTITUTION:A combination of washing with a rubbing member, such as a nylon brush 6, and washing with an org. solvent capable of dissolving plastics, such as acetone, is used for the washing step of a photomask glass base plate 1. Washing with the org. solvent is desirable for the washing step following the washing step with a rubbing member 6. Abrasives are mainly removed among sheet-shaped foreign matters 3, 5 of abrasives and foreign matters made of plastics and abrasives adhering to the main face 4 and the side faces 3 of the base plate 1, and then, plastics, such as polycarbonate, is removed with an org. solvent. As a result, pinholes and pattern defects, etc. never occur in the following photolithographic process. |
