| 摘要 |
PURPOSE:To obtain a high precision pattern by drawing a pattern which requires correction with specific quantity of electron beam irradiation among exposure patterns obtained by diving a pattern which is to be formed into rectangles. CONSTITUTION:In order to correct the extent of each pattern, at first, quantity of dimension correction Si within a pattern and quantity of irradiation Qi to obtain the dimensions of a required pattern are sought. Among patterns A and B, if the pattern A requires correction, assume QA is quantity of irradiation of the pattern A, fB is strength of effect on a sample point (a) caused by the pattern B, FB is strength of effect on a sample point (b) caused by the pattern B and (q) is quantity of irradiation of the pattern A without considering effects of surrounding patterns, then quantity of irradiation QA of the minute pattern A becomes approximately, QA=q(1-fB/FB). Considering effects of surrounding patterns, quantity of correction of the dimensions between patterns is also sought for pattern data. |
