METHOD OF APPLICATION OF ZINC OXIDE LAYER,BEING THE SOURCE OF DIFFUSION OF ZINC ON THE SURFACE OF SEMICONDUCTOR COMPOUNDS OF AIII-UPWARDS-BV-UPWARDS TYPE,申请号PL19800222596-传众专利搜索

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发明名称	METHOD OF APPLICATION OF ZINC OXIDE LAYER,BEING THE SOURCE OF DIFFUSION OF ZINC ON THE SURFACE OF SEMICONDUCTOR COMPOUNDS OF AIII-UPWARDS-BV-UPWARDS TYPE
摘要
申请公布号	PL132303(B1)	申请公布日期	1985.02.28
申请号	PL19800222596	申请日期	1980.03.11
申请人		发明人
分类号	H01L;H01L21/225;(IPC1-7):C23C11/08	主分类号	H01L
代理机构		代理人
主权项
地址

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