发明名称 |
METHOD AND APPARATUS FOR DEPOSITING COATINGS IN A GLOW DISCHARGE |
摘要 |
A method and apparatus for coating substrates by glow discharge in which the generation of ions and deposition of a coating are controlled independently. A plasma is established inside a chamber by application of either RF or DC voltages to a cathode, e.g., an aluminium cathode. Above the cathode a substrate is held on a substrate holder whose temperature can be controlled independently of the plasma temperature. An electrical bias may be applied to the substrate. Ions in the plasma strike the cathode and a number leave the cathode to strike the substrate and form the required coating. The coating may be hard carbon from a hydro-carbon gas e.g. butane, or silicon from silane gas, or germanium from germane gas. The substrate may be electrically conducting or insulating. |
申请公布号 |
DE3167761(D1) |
申请公布日期 |
1985.01.31 |
申请号 |
DE19813167761 |
申请日期 |
1981.01.07 |
申请人 |
NATIONAL RESEARCH DEVELOPMENT CORPORATION |
发明人 |
GREEN, GEOFFREY WILLIAM;LETTINGTON, ALAN HAROLD |
分类号 |
C04B41/87;C01B31/04;C23C14/34;C23C16/26;C23C16/27;C23C16/458;C23C16/50;H01L21/205;H01L31/20;(IPC1-7):23C11/00;23C15/00 |
主分类号 |
C04B41/87 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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