| 摘要 |
PURPOSE:To prevent intrusion of an impurity in a crystal film with a titled device which fixes and heats a susceptor and a sample by means of a holder mounted to an inserting bar by providing the sample on the bottom surface of the susceptor and facing downward the sample surface. CONSTITUTION:A susceptor 3 is of an approximately triangular shape and a sample 2 is disposed on the downward facing side face thereof. A holder 4 which fixes the sample 2 and the susceptor has a window 4a through which the sample 2 surface is exposed to the gas to be introduced into the device. Since the holder 4 supports both ends of the sample 2, the sample 2 is sandwiched by the holder 4 and the susceptor 3. The sample 2 with the surface faced downward is placed on the holder 4 in the above-mentioned way. The susceptor 3 is placed on the sample 2 to hold the sample 2 and the sample 2 is inserted into a reaction tube 1 by means of an inserting bar 5. A high frequency coil 6 is thereupon excited to heat the susceptor 3 and to heat the sample 2. Gas is passed from a feed pipe 7 to perform vapor growth on the sample 2 surface. The sticking of the deposit except the grown film on the sample 2 surface is thus prevented. |
