发明名称 |
MONITORING METHOD OF PLASMA AND MONITOR |
摘要 |
PURPOSE:To obtain the density or rate distribution of a specific chemical species in plasma by selecting sequentially measurement positions of the plasma and separating plasma light from each measurement position. CONSTITUTION:A monitor collect plasma light 2 at measurement positions in a working device 1, and a spectral means 4 extracts all of the plasma light 2 and plasma light 2a of specific wavelength emitted by the specific chemical species in the plasma light 2 alternately. The spectral means 4 is formed by fixing the discoid filter 43 consisting of a filter part 41 passing the light of the specific wavelength and plural kinds of dimming filter parts 42 having no wavelength selectivity and the discoid mask 46 consisting of a light transmission part 44 and a light shield part 45 to the rotating shaft 48 of a motor. The phases of the filter 43 and mask 46 are so set that the detection output ratio of the plasma light 2 and plasma light 2a is a proper value. A light collecting means 3 is moved to an optional position in a window 14 through a scanning mechanism. |
申请公布号 |
JPS606852(A) |
申请公布日期 |
1985.01.14 |
申请号 |
JP19830112743 |
申请日期 |
1983.06.24 |
申请人 |
HITACHI SEISAKUSHO KK |
发明人 |
OSADA HISAJIROU;HIRATSUKA YUTAKA;WATANABE MASAHIRO |
分类号 |
C23F4/00;C23C14/54;G01J3/28;G01N21/64;H01L21/302;H01L21/3065;(IPC1-7):G01N21/64;C23F1/00 |
主分类号 |
C23F4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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