| 摘要 |
PURPOSE:To contrive to simplify the process by a method wherein a mesa etching mask and the breakdown layer of a mesa groove are removed at the same time. CONSTITUTION:A base region 3 of plane junction is formed on a collector region 4, and emitter regions 6 are formed on the base region in plurality by burial. An insulation film 5 is formed on the surface, and electrodes 2 are given to the base region 3 and the emitter regions via apertures of the insulation film 5. The mesa etching mask 1 is formed on this surface, the mesa grooves 7 down to the collector region 4 then being formed in a mechanical manner by means of a dicing saw or wire saw, etc. between the emitter regions 6 from the mask 1. The mask 1 and the mechanic breakdown layer 9 of the grooves 7 are removed at the same time with etchant. Since the bottom of the base region 3 corresponding to each emitter region comes to plane junction to the collector 4, the title device is formed. |
