| 摘要 |
PURPOSE:To reduce the amount of a resist soln. to be fed by setting a substrate so that the surface on which a resist is coated is positioned downward and by carrying out spin coating. CONSTITUTION:A substrate 12 for a photomask is attached to a vacuum chuck 11 fixed on the lower end of a suspended rotating shaft 10 so that a metallic chromium film 12a formed on one side of the substrate 12 is positioned downward. The surface of the film 12a is brought into contact with the surface of a resist soln. 14 to stick thinly the resist soln. to the surface of the film 12a. The surface of the film 12a is then separated from the soln. 14, and the shaft 10 is rotated at high speed to scatter an excess of the resist soln. on the surface of the film 12a. The remaining resist soln. is dried to form a thin resist film of a uniform thickness on the surface of the film 12a. |
