| 摘要 |
PURPOSE:To make an optical sensor small-sized, and to manufacture it easily by layering and forming a metallic film interference filter formed in a multilayer film structure by placing a dielectric film between metallic films, and a sharp cut filter, as one body on a photodetecting surface of a photoelectric element. CONSTITUTION:An optical sensor 1 is constituted of a photodetector 3 formed on a semiconductor substrate 2, a metallic film interference filter 4 which is layered on a photodetecting surface of this photodetector 3, and formed as one body continuously, and a sharp cut filter 5. The metallic film interference filter 4 is constituted of alternate layers of a metallic film and a dielectric film in order of a metallic film 6 a dielectric film 7 a metallic film 8. Also, the sharp cut filter 5 is constituted of an optical absorbing film, and the kind and the film thickness of this optical absorbing film have an absorbing end which can cut off an unnecessary transmission band. According to such constitution, it is possible to make the optical sensor small-sized, and to manufacture it easily.
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