| 摘要 |
PURPOSE:To form a magnetic thin film having good quality within a shorter time, in an opposed target sputtering system for preparing a membrance, by providing a material having high saturation magnetic flux density to the magnetic pole of a permanent magnet material constituting a magnetic circuit. CONSTITUTION:In an apparatus of an opposed target sputtering system for preparing a film, a magnetic circuit constituted by contacting a yoke having high saturation magnetic flux density with one of the poles of a magnet is provided. For example, soft iron with 4piMs of 14,000G is attached to the leading end of a permanent magnet as a pole piece to fabricate a magnetic membrance. When the magnetic field distribution on a target is measured, it is 180G in the outer peripheral part and 120G in the central part while the growing speed of the membrane is 1.7mu/min and there is no partial consumption of the target. The magmetic characteristics of the obtained membrane is Hc=830Oe. As mentioned above, the setting of the optimum distribution and intensity of a magnetic field is enabled and, therefore, the magnetic membrance having good quality can be prepared within a shorter time. |
