HEATING METHOD OF BASE PLATE FOR VAPOR DEPOSITION

摘要

PURPOSE:To eliminate uneven temp. of a large base plate without decreasing much heating efficiency in the stage of performing vapor deposition by heating the base plate and manufacturing a thin film by prohibiting the tight contact between the base plate and a heating element. CONSTITUTION:A base plate 3 of a sapphire C plane which is about one inch square is fixed by means of pins 4 via spacers 2, 2' consisting of four thin stainless steel billets to a heating element 1 attached to a stainless steel plate by winding a heater wire. A base plate 3 is then heated by radiation of the element 1 and the surface of the plate 3 is subjected to reactive sputtering vapor deposition by using a target consisting of oxide of lead.La.Ti. The thin film free from uneven compsn. and film thickness is obtd. by the reactive vapor deposition of the multi-element compd. as mentioned above according to such method.