VAPOR DEPOSITION SOURCE, METHOD FOR FORMING THIN FILM, AND IMPLANTING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition source for uniformly irradiating a substrate sample with plasma, a method for forming a thin film with the use of the vapor deposition source, and a method for implanting the plasmatized target material into the substrate. SOLUTION: A vacuum vessel 20 has a long target material 1 for generating plasma under an atmosphere of reduced pressure, a trigger electrode 3 for triggering discharge, which is arranged around the target material 1 through the medium of an insulation tube 5, a vapor deposition source 11 having an arc electrode 4 for generating arc discharge 10 initiated by trigger discharge, which is arranged around the long target material 1 through a space. The arc electrode 4 has a spiral body of a coil shape, which makes the target material 1 as a shaft. The substrate 12 is arranged so that the surface 12a to be film formed can face to the opening end of the coil shape.