发明名称 APPARATUS FOR FORMING AMORPHOUS SILICON FILM
摘要 PURPOSE:To remove powdery amorphous silicon formed in a reaction chamber efficiently in a short time and obtain a photosensitive material without pinholes, by using an electrode and a heater provided detachably to the reaction chamber. CONSTITUTION:A molded material 10 for forming films is set on a bearer and the lower peripheral part of a counter electrode and a gas jetting pipe 4 is engaged with an insulating ring 19'. A gear part (7b) of a turntable 7 is meshed with a gear 21 of a motor 5, and a gas inlet part (4c) of a jetting pipe 4 is connected to a gas inlet pipe 13, and then the upper member (3b') of a vacuum reaction vessel 3' is placed on the lower member (3a'). Amorphous silicon is deposited on the material 10 for forming films to close a valve 12 of the gas inlet pipe 13. N2 gas is introduced into the reaction vessel 3' to return the internal pressure thereof to atmospheric pressure. The upper member (3b') is disassembled with an O-ring member 21 to take out the internal unit 24, and powdery amorphous silicon on the surface of the gas jetting pipe 4 and in the reaction vessel 3' is removed.
申请公布号 JPS59217615(A) 申请公布日期 1984.12.07
申请号 JP19830090296 申请日期 1983.05.23
申请人 TOSHIBA KK 发明人 YOSHIZAWA HIDEJI
分类号 C23C16/24;C01B33/02;C23C16/44;C23C16/455;G03G5/08;G03G5/082;(IPC1-7):C01B33/02;C23C11/00 主分类号 C23C16/24
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