Ion implantation apparatus,申请号DE19813146409-传众专利搜索

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发明名称	Ion implantation apparatus
摘要	Published without abstract.
申请公布号	DE3146409(C1)	申请公布日期	1984.12.06
申请号	DE19813146409	申请日期	1981.04.27
申请人	HITACHI, LTD., TOKIO/TOKYO, JP	发明人	SHUNROKU, TAYA, MITO, IBARAKI, JP;KATSUNOBU, ABE;ATSUSHI, SHIBATA, KATSUTA, IBARAKI, JP
分类号	C30B31/22;H01J37/05;H01J37/317;H01L21/265;(IPC1-7):C30B31/22	主分类号	C30B31/22
代理机构		代理人
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