发明名称 OPTICAL CVD APPARATUS
摘要 PURPOSE:To make it possible to treat a large number of substrates according to an optical vapor phase reaction method, by applying light energy to a substrate in parallel to the surface to be formed thereof from the outside of a reaction tube made of quartz. CONSTITUTION:Substrates 2 each having a surface to be formed are provided in a reaction tube 1 made of quarts arranged in a horizontal direction so as to have constant intervals therebetween and to stand close together in the direction vertical to the stream of reactive gases while a rod shaped or a spiral disc shaped light energy supply means 4 coaxial to the reaction tube arranged so as to encircle the reaction tube 1 is provided to the outside of the reaction tube 1. In addition, a heating apparatus 6 is provided to the outside of the means 4 and reactive gases are supplied from means 11, 7 while a reaction product and unnecessary reactive gases are further discharged from means 16, 12, 13. By this vapor phase reaction method, a large number of substrates can be treated.
申请公布号 JPS59216630(A) 申请公布日期 1984.12.06
申请号 JP19830091277 申请日期 1983.05.24
申请人 HANDOUTAI ENERUGII KENKYUSHO:KK 发明人 YAMAZAKI SHIYUNPEI
分类号 G02B1/10;B01J19/12;C23C16/48;(IPC1-7):B01J19/12 主分类号 G02B1/10
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