| 摘要 |
PURPOSE:To obtain an embossed decorative material having a sharp pattern synchronous to a picture pattern, by a method wherein a picture pattern is formed to a recessed part by a paint containing a siliceous extender pigment while a picture pattern is formed to a protruded part by a curable ink and, thereafter, the entire surface is coated with an electron beam curable paint which is, in turn, irradiated with electron beam. CONSTITUTION:An ink or paint containing 10-50pts.wt. of a siliceous extender pigment is applied to the entire surface or the recessed part 2 of a substrate in a picture pattern form. Subsequently, a picture pattern is formed to a part where the expression of a protruded part 3 is wanted by a curable or solvent resistant ink. Thereafter, a top cost paint 3 comprising an electron beam curable resin is applied to the entire surface of the substrate and, when electron beam is irradiated to perform curing while a line speed is set to 150-400m/min, uneveness is formed by the penetration difference of the top coat paint. By this method, an embossed decorative material having a sharp pattern synchronous to the picture pattern and an excellent design is prepared in an extremely efficient manner.
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