SELF-SENSITIZING PHOTOSENSITIVE RESIN

摘要

PURPOSE:To obtain a self-sensitizing photosensitive resin showing sufficient reactivity in a photo-cross-linking reaction without adding a sensitizer by bringing a polymer having epoxy groups in the side chain and a specified compound having a photosensitive group and a sensitizing group in the same molecule into an addition reaction. CONSTITUTION:A polymer having epoxy groups in the side chain such as a methyl methacrylate-glycidyl methacrylate copolymer and a nitroaryl cinnamate such as p-nitrophenyl cinnamate are brought into an addition reaction. The resulting addition reaction product has photosensitive groups and sensitizing groups introduced at once, so it gives a self-sensitizing photosensitive resin showing sufficient reactivity in a photo-cross-linking reaction without adding a sensitizer. The addition reaction is carried out at about 70-200 deg.C for about 5-48hr in a solvent such as ''Sulpholane'' in the presence of a catalyst such as a tertiary amine or a quat. ammonium salt.