| 摘要 |
PURPOSE:To provide the titled compsn. which can be easily processed into a wax pattern and has good shape retension after processing, by incorporating a polymerizable monomer and a photopolymerization initiator in wax. CONSTITUTION:A wax compsn. is obtd. by incorporating a polymerizable monomer having a (meth)acryloyl group at its terminal or its oligomer having a (meth)acryloyl group at its terminal (e.g. phenoxytriethylene glycol acrylate) and a photopolymerization initiator (e.g. benzophenone) in wax (e.g. beeswax or paraffin wax). Wax patterns prepd. from conventional wax compsn. for lost wax process easily undergoes changes in its shape so that productivity is low and manufacturing cost is increased. By incorporating said polymerizable monomer and the photopolymerization initiator, a compsn. can be obtd. which can be processed into a wax pattern which has good shape retention after irradiating it with actinic rays to photopolymerize it.
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