| 摘要 |
PURPOSE:To obtain the device capable of exposure with high-intensity parallel X-rays by converting X-ray emitted from an X-ray source into a bundle of ring- belt-shape parallel X-rays by use of an X-ray intensity strengthened collimating system. CONSTITUTION:A part 10 of X-ray emitted from an X-ray source 1 enters in a hyperbolic inner cylindrical mirror 11 with a minutely inclined incident angle and is reflected by total reflection. Furthermore, the X-ray is totally reflected by a barabolic innder cylindrical mirror 12 and is converted into a bundle 10A of ring-belt-shape parallel X-rays. By use of a converting sytem composed of conic inner cylindrical mirrors 13 and 14 and conic outer mirrors 15 and 16, the X- rays are converted into parallel X-rays 10B which have a high intensity and are ring-belt shaped with a small diameter (d). Consequently, it becomes possible not only to fabricate the high-resolution patterns by eliminating a displacement on a wafer, but also to shorten the exposure time by increasing the intensity of the X-ray to several times. |
