发明名称 Brown stain suppressing phenol free and chlorinated hydrocarbon free photoresist stripper.
摘要 <p>Stripping solution compositions which avoid the problem known as "brown staining" are provided. Relevant stripping solutions are those that are free from phenol and chlorinated hydrocarbon compounds and comprise a surfactant alkylarylsulfonic acid having 12-20 carbons, a hydrotropic aromatic sulfonic acid having 6-9 carbons and a halogen-free aromatic hydrocarbon solvent with a boiling point above 150°C. To suppress brown staining, a water soluble sulfone is incorporated into the stripping solution. The stripping compositions effectively remove organic polymeric substances from inorganic substrates and are substantially clear water rinsable.</p>
申请公布号 EP0126241(A2) 申请公布日期 1984.11.28
申请号 EP19840103301 申请日期 1984.03.26
申请人 HMC PATENTS HOLDING CO., INC. 发明人 THOMAS, EVAN GOWER
分类号 H01L21/30;C23G1/02;G03F7/26;G03F7/32;G03F7/42;H01L21/027 主分类号 H01L21/30
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