发明名称 |
Brown stain suppressing phenol free and chlorinated hydrocarbon free photoresist stripper. |
摘要 |
<p>Stripping solution compositions which avoid the problem known as "brown staining" are provided. Relevant stripping solutions are those that are free from phenol and chlorinated hydrocarbon compounds and comprise a surfactant alkylarylsulfonic acid having 12-20 carbons, a hydrotropic aromatic sulfonic acid having 6-9 carbons and a halogen-free aromatic hydrocarbon solvent with a boiling point above 150°C. To suppress brown staining, a water soluble sulfone is incorporated into the stripping solution. The stripping compositions effectively remove organic polymeric substances from inorganic substrates and are substantially clear water rinsable.</p> |
申请公布号 |
EP0126241(A2) |
申请公布日期 |
1984.11.28 |
申请号 |
EP19840103301 |
申请日期 |
1984.03.26 |
申请人 |
HMC PATENTS HOLDING CO., INC. |
发明人 |
THOMAS, EVAN GOWER |
分类号 |
H01L21/30;C23G1/02;G03F7/26;G03F7/32;G03F7/42;H01L21/027 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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