| 摘要 |
PURPOSE:To wash a reaction tube to be used for processing semiconductor substrate under the practical application by providing a plurality of blowing ports from which the washing gas blows, facing to the specified direction. CONSTITUTION:A washing apparatus (washing tube) 9 is inserted into a reaction tube 3. This reaction tube 9 is provided with the main tube 10 for supplying the washing gas to the reaction gas inlet port 7 from the reaction gas outlet 8 of reaction tube 3 and three blowing ports 11a-11c for blowing the washing gas into the reaction tube 3 in the direction opposing to the main tube 10 by receiving the washing gas from the main tube 10. Meanwhile, the blowing port 11c is located at the upper part of blowing ports 11a and 11b and is oriented almost parallel to the axial center of reaction tube 3. Owing to such formation, the reaction tube to be used for semiconductor substrate processing can be washed under the condition that it is in the practical application. |
