发明名称 CRUCIBLE FOR EVAPORATION SOURCE
摘要 PURPOSE:The titled crucible used in vapor deposition capable of evaporating various kinds of substances at a high temp. without being damaged by the reaction with evaporation substances, constituted by coating the outer surface of a crucible main body made of a material hardly reactive with the evaporation substances with a coating material made of a conductive material is obtd. CONSTITUTION:For example, a crucible main body 1 and a crucible lid 3 used in cluster ion beam vapor deposition are constituted of a material hardly reactive with a vapor deposition substance, e.g. ceramics such as zirconia or magnesia. The outer surfaces of the main body 1 and the lid 3 are coated with coating materials 2, 4 comprising graphite. By this method, the generation of charge-up is prevented even if the crucible is heated by electron bombardment and the reaction of the main body 1 and the lid 3 with an evaporation substance 5 even during a time when the temp. of the crucible rises to inject the evaporation substance from a nozzle 6.
申请公布号 JPS59203644(A) 申请公布日期 1984.11.17
申请号 JP19830079503 申请日期 1983.05.06
申请人 MITSUBISHI DENKI KK 发明人 YAMANISHI KENICHIROU;KOU SANJIYU;MOMIYAMA KIMIO
分类号 B01J19/00;B01L3/04;C23C14/24 主分类号 B01J19/00
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