| 摘要 |
PURPOSE:To deposit a metal on a substrate in high bonding strength, by irradiating a substrate part to which a metal must be deposited with laser beam so as not to destroy said part before performing metal deposition. CONSTITUTION:After a deposition cell 5 is evacuated to about 10<-3> Torr by a pump 10, a specimen substrate 4 is irradiated with laser beam from a laser oscillation 1. The intensity of laser beam at this time is made slightly lower than intensity for generating the surface destruction of the substrate 4 and the irradiated part is heated to about 400-500 deg.C to activate the surface thereof. Subsequently, a stock material valve 9 is opened to flow organometal vapor into the deposition cell 5 and exciting input to the laser oscillator 1 is changed to control the intensity of laser beam so as to generate metal deposition based on the dessociation of the organometal at a desired speed whille the deposited metal is heated by the absorption of laser beam so as not to generate the surface destruction of the specimen substrate. |
