发明名称 |
CERAMICS TARGET FOR SPUTTERING |
摘要 |
PURPOSE:To form a membrane with good membrane quality in a mass production system by preventing the crack generation of a ceramics target, by relieving internal stress caused by the rising in temp. during sputtering by providing a large number of grooves to the upper surface of the ceramics target. CONSTITUTION:A large number of grooves 2 are provided to the surface side of a target 1 and a metallic cathode plate 3 is connected to the back surface side thereof while the target 1 is cooled through the cathode plate 3. It is unnecessary that the grooves 2 reach the cathode plate 3 and it is desirable that the width of each groove 2 is made narrower. The surface temp. of the target 1 rises during sputtering but distributed as shown by the broken line 5 and internal stress generated by thermal expansion is relieved by providing the grooves 2 and no crack is generated. |
申请公布号 |
JPS59197568(A) |
申请公布日期 |
1984.11.09 |
申请号 |
JP19830070387 |
申请日期 |
1983.04.21 |
申请人 |
MATSUSHITA DENKI SANGYO KK |
发明人 |
FUJITA YOUSUKE;KUWATA JIYUN;NISHIKAWA MASAHIRO;TOUDA TAKAO;MATSUOKA TOMIZOU;ABE ATSUSHI;NITSUTA KOUJI |
分类号 |
B01J19/08;C23C14/34;H01L21/31;H01L21/363 |
主分类号 |
B01J19/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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