Dry etching apparatus using reactive ions.

摘要

A dry etching apparatus using reactive ions is disclosed. A housing (13) in which a workpiece (18) is etched is provided with a cathode electrode (12) on which the workpiece (18) is mounted, and a an anode electrode (11) arranged opposite the cathode electrode. An etching gas is supplied to the housing, and pressure inside of the housing is held at a certain level. High frequency voltage is applied between the cathode and the anode electrodes. A plurality of magnets (19) are arranged outside of the housing to generate magnetic fields (B) around the cathode electrode. The

plurality of magnets are separated from one another, with a predetermined clearance being interposed therebetween, to form an endless track. The plurality of magnets are moved along the endless track, to thereby cause the magnetic fields (B) to be moved in one direction on the cathode electrode.