Method of treating direct positive silver halide sensitive material

摘要

A method of treating a direct positive silver halide sensitive material is disclosed. The material is comprised of a base having thereon a compound represented by the general formula (I), a sensitive silver halide photographic emulsion layer and a hydrophilic colloid layer. The exposed material is developed in the presence of the compound represented by the general formula (II) (I) wherein R1 and R2 independently represent a hydrogen atom, an aliphatic residue, an aromatic residue or a heterocyclic residue, R3 represents a hydrogen atom or an aliphatic residue, R4 represents a hydrogen atom, an aliphatic residue or an aromatic residue, and X represents a divalent aromatic residue; (II) wherein R1 and R2 represent each a hydrogen atom or an aliphatic residue, and R1 and R2 may form a ring by linking together, R3 represents a divalent aliphatic residue, X represents a single bond or a divalent heterocyclic ring containing nitrogen, oxygen or sulfur atoms, and M represents a hydrogen atom, an alkali metal, an alkaline earth metal, a quaternary ammonium salt, a quaternary phosphonium salt or an amidino group. The invention provides a process wherein the sharpness and edge effects of direct positive images are greatly improved. The results obtained with the process do not vary due to changes in the bromine ion concentration in the developing solution or the pH thereof.